Wet anisotropic etching is extensively employed in silicon bulk micromachining to fabricate
microstructures for various applications in the field of microelectromechanical systems …

Wet anisotropic etching based silicon micromachining is an important technique to fabricate
freestanding (eg cantilever) and fixed (eg cavity) structures on different orientation silicon …

Microelectromechanical systems (MEMS)-based sensors and actuators have become
remarkably popular in the past few decades. Rapid advances have taken place in terms of …

In this work the authors report on the controlled electrochemical etching of high‐aspect‐ratio
(from 5 to 100) structures in silicon at the highest etching rates (from 3 to 10 µm min− 1) at …

The gravimetric hydrogen storage efficiency of silicon has been widely reported as 14 wt.%,
suggesting that this material should be an excellent hydrogen generation source for portable …

Regenerative electroless etching (ReEtching), described herein for the first time, is a method
of producing nanostructured semiconductors in which an oxidant (Ox1) is used as a catalytic …

In this paper, we present for the first time a systematic investigation of the role of the surface
tension in anisotropic wet etching of silicon, focusing on the sidewall angle. We show that in …

Silicon wet bulk micromachining is an extensively used technique in
microelectromechanical systems (MEMS) to fabricate variety of microstructures. It utilizes low …

The junctionless nanowire transistor is a promising alternative for a new generation of
nanotransistors. In this letter the atomic force microscopy nanolithography with two wet …

In this letter, we investigate the impact of potassium hydroxide (KOH) etching procedure on
Silicon nanostructure fabricated by Atomic force microscopy on P-type Silicon-on-insulator …