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[HTML][HTML] On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography
This work examines the isofocality of four commercially available positive resists for electron
beam lithography (EBL) at 100 keV: AR-P 6200 (commercially known as CSAR 62) by …
beam lithography (EBL) at 100 keV: AR-P 6200 (commercially known as CSAR 62) by …