A comparative study of different physics-based NBTI models

S Mahapatra, N Goel, S Desai, S Gupta… - IEEE transactions on …, 2013‏ - ieeexplore.ieee.org
Different physics-based negative bias temperature instability (NBTI) models as proposed in
the literature are reviewed, and the predictive capability of these models is benchmarked …

A modeling framework for NBTI degradation under dynamic voltage and frequency scaling

N Parihar, N Goel, A Chaudhary… - IEEE Transactions on …, 2016‏ - ieeexplore.ieee.org
A modeling framework is proposed to predict the degradation and recovery of threshold
voltage shift (ΔV T) due to negative bias temperature instability. Double interface reaction …

[كتاب][B] Fundamentals of bias temperature instability in mos transistors

S Mahapatra - 2016‏ - Springer
Bias Temperature Instability (BTI) is a serious reliability concern and continues to threaten
the performance and lifetime of Complementary MOS (CMOS) devices and circuits. BTI …

Interaction of Negative Bias Instability and Self-Heating Effect on Threshold Voltage and SRAM (Static Random-Access Memory) Stability of Nanosheet Field-Effect …

X Li, Y Shao, Y Wang, F Liu, F Kuang, Y Zhuang, C Li - Micromachines, 2024‏ - mdpi.com
In this paper, we investigate the effects of negative bias instability (NBTI) and self-heating
effect (SHE) on threshold voltage in NSFETs. To explore accurately the interaction between …

NBTI in nanoscale MOSFETs—The ultimate modeling benchmark

T Grasser, K Rott, H Reisinger, M Waltl… - … on Electron Devices, 2014‏ - ieeexplore.ieee.org
After nearly half a century of research into the bias temperature instability, two classes of
models have emerged as the strongest contenders. One class of models, the reaction …

Analysis of SRAM metrics for data dependent BTI degradation and process variability

JB Shaik, S Singhal, N Goel - Integration, 2020‏ - Elsevier
Abstract Bias Temperature Instability (BTI) is one of the most crucial reliability issues in
modern CMOS technology. It leads to shift in device parameters, which eventually affect …

Modeling of DC-AC NBTI stress-recovery time kinetics in P-channel planar bulk and FDSOI MOSFETs and FinFETs

N Choudhury, N Parihar, N Goel… - IEEE Journal of the …, 2020‏ - ieeexplore.ieee.org
The physics-based BTI Analysis Tool (BAT) is used to model the time kinetics of threshold
voltage shift (ΔV T) during and after NBTI in p-channel planar bulk and FDSOI MOSFETs …

Universality of NBTI-From devices to circuits and products

S Mahapatra, V Huard, A Kerber… - 2014 IEEE …, 2014‏ - ieeexplore.ieee.org
This paper showcases the universality of NBTI and its dependencies on time, bias,
temperature, AC frequency and pulse duty cycle across different process integration …

HKMG process impact on N, P BTI: Role of thermal IL scaling, IL/HK integration and post HK nitridation

K Joshi, S Hung, S Mukhopadhyay… - 2013 IEEE …, 2013‏ - ieeexplore.ieee.org
NBTI and PBTI are studied in IL/HK/MG gate stacks having EOT down to~ 6Å and fabricated
using low T RTP based thermal IL and a novel IL/HK integration. At equivalent EOT …

Towards reliability-aware circuit design in nanoscale FinFET technology:—New-generation aging model and circuit reliability simulator

S Guo, R Wang, Z Yu, P Hao, P Ren… - 2017 IEEE/ACM …, 2017‏ - ieeexplore.ieee.org
In this paper, an industry-level new-generation EDA solution for reliability-aware design in
nanoscale FinFET technology is presented for the first time, with new compact transistor …