Atomic layer deposition is widely acknowledged as a powerful technique for the deposition
of high quality layers for several applications including photovoltaics (PV). The capability of …

Advances in device technology have been accompanied by the development of new types
of materials and device fabrication methods. Considering device design, initiated chemical …

The removal of hydrogen sulfide (H2S) is essential in various industry applications such as
purification of syngas for avoiding its corrosion and toxicity to catalysts. The design of …

With the continued miniaturization of devices in the semiconductor industry, atomic layer
deposition (ALD) of silicon nitride thin films (SiNx) has attracted great interest due to the …

Encapsulation of organic (opto-) electronic devices, such as organic light-emitting diodes
(OLEDs), photovoltaic cells, and field-effect transistors, is required to minimize device …

Organic electronics research has received significant attention in recent years. The majority
of this research has focused on the development of organic photovoltaic cells (OPVs) and …

Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium
tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as …

The present study introduces a process for the synthesis of functional films onto substrates
directly from the liquid phase. The reported method is based on the initialization of the …

Atomic/molecular layer deposited (ALD/MLD) inorganic–organic thin films form a novel class
of materials with tunable properties. In selected cases, hybrid materials are reported to show …

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is
demonstrated to provide an easily up-scalable one-step method toward the deposition of a …