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Determining the shape and periodicity of nanostructures using small-angle x-ray scattering
The semiconductor industry is exploring new metrology techniques capable of meeting the
future requirement to characterize three-dimensional structure where the critical dimensions …
future requirement to characterize three-dimensional structure where the critical dimensions …
[ספר][B] Metrology and Diagnostic Techniques for Nanoelectronics
Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
Metrology methods, metrology apparatus and device manufacturing method
R Quintanilha, S Danylyuk - US Patent 10,067,074, 2018 - Google Patents
(57) ABSTRACT A lithographic manufacturing system produces periodic structures with
feature sizes less than 10 nm and a direction of periodicity (D). A beam of radiation (1904) …
feature sizes less than 10 nm and a direction of periodicity (D). A beam of radiation (1904) …
X-ray scattering critical dimensional metrology using a compact x-ray source for next generation semiconductor devices
Semiconductor devices continue to shrink in size with every generation. These ever smaller
structures are challenging the resolution limits of current analytical and inline metrology …
structures are challenging the resolution limits of current analytical and inline metrology …
Applicability of the Debye-Waller dam** factor for the determination of the line-edge roughness of lamellar gratings
Periodic nanostructures are fundamental elements in optical instrumentation as well as
basis structures in integrated electronic circuits. Decreasing sizes and increasing complexity …
basis structures in integrated electronic circuits. Decreasing sizes and increasing complexity …
Uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering
Increasing miniaturization and complexity of nanostructures require innovative metrology
solutions with high throughput that can assess complex 3D structures in a non-destructive …
solutions with high throughput that can assess complex 3D structures in a non-destructive …
[HTML][HTML] Uncertainty quantification on small angle x-ray scattering measurement using Bayesian deep learning
Small angle x-ray scattering (SAXS) is a widely recognized solution for measuring complex
nanostructures. With the increasing demand for accurately assessing structural …
nanostructures. With the increasing demand for accurately assessing structural …
Evaluation of the effect of data quality on the profile uncertainty of critical dimension small angle x-ray scattering
A line grating prepared via a self-aligned quadruple patterning method was measured using
critical dimension small angle x-ray scattering. A Monte Carlo Markov chain algorithm was …
critical dimension small angle x-ray scattering. A Monte Carlo Markov chain algorithm was …
Metrology method, metrology apparatus and device manufacturing method
R Quintanilha - US Patent 10,222,709, 2019 - Google Patents
ABSTRACT A pattern is applied to a substrate by a lithographic apparatus as part of a
lithographic manufacturing system. Structures are produced with feature sizes less than 10 …
lithographic manufacturing system. Structures are produced with feature sizes less than 10 …
Transmission small-angle X-ray scattering metrology system
AV Shchegrov, AA Gellineau, S Zalubovsky - US Patent 10,767,978, 2020 - Google Patents
Methods and systems for characterizing dimensions and material properties of
semiconductor devices by transmis sion small angle X-ray scatterometry (TSAXS) systems …
semiconductor devices by transmis sion small angle X-ray scatterometry (TSAXS) systems …