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Reactive cleaning of substrate support
X Chen, SY Rao, S Guo, CH Ching… - US Patent …, 2023 - Google Patents
Methods of cleaning a substrate support comprise: introducing a cleaning gas into a
processing chamber containing the substrate support; applying a radio frequency (RF) …
processing chamber containing the substrate support; applying a radio frequency (RF) …
High-temperature chamber and chamber component cleaning and maintenance method and apparatus
S Sheng, L Zhang, J Huang, JS Oh, JC Werner… - US Patent …, 2023 - Google Patents
Examples disclosed herein relate to a method and apparatus for cleaning and repairing a
substrate support having a heater disposed therein. A method includes (a) cleaning a …
substrate support having a heater disposed therein. A method includes (a) cleaning a …
Ash rate recovery method in plasma strip chamber
KIM Yongkwan, C Lee, KT Lee, CH Kim… - US Patent …, 2024 - Google Patents
A method for recovering ashing rate in a plasma processing chamber includes positioning a
substrate in a processing volume of a processing chamber, wherein the substrate has a …
substrate in a processing volume of a processing chamber, wherein the substrate has a …