Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous
reactants and an exposed solid surface to deposit highly conformal coatings with a thickness …

Over the last few decades there has been a huge interest in nanostructured functional
materials and assembly techniques for preparing functional molecular assemblies with …

We report a method for using battery electrode materials to directly and continuously control
the lattice strain of platinum (Pt) catalyst and thus tune its catalytic activity for the oxygen …

2D materials are layered crystalline materials and are the most attractive nanomaterials due
to their potentials in next-generation electronics. Because most 2D materials are atomically …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Abstract Three‐dimensional (3D) porous metal and metal oxide nanostructures have
received considerable interest because organization of inorganic materials into 3D …

Development at the nanoscale has established diverse and complex structures with the help
of a growing selection of materials to choose from. Among the major developments that has …

Synthetic methods that allow for the controlled design of well-defined Pt nanoparticles are
highly desirable for fundamental catalysis research. In this work, we propose a strategy that …

Amorphous Ga2O3 thin films have been grown on SiO2/Si substrates by atomic layer
deposition (ALD) using tris (2, 2, 6, 6-tetramethyl-3, 5-heptanedionato) gallium (III)[Ga …

Controlling the morphology of noble metal nanoparticles during surface depositions is
strongly influenced by precursor–substrate and precursor–deposit interactions. Depositions …