FeFET Reliability Modeling for In-Memory Computing: Challenges, Perspective, and Emerging Trends

S Thomann, H Amrouch - IEEE Transactions on Electron …, 2023 - ieeexplore.ieee.org
Ferroelectric FET (FeFET) is a singularly attractive emerging technology with a rich feature
set. Boasting high versatility, it has already been implemented in a host of applications, like …

Optimization and analysis of Si/SiGe strained vertically stacked heterostructure on insulator FeFinFET for high performance analog and RF applications

K Verma, R Chaujar - Physica Scripta, 2024 - iopscience.iop.org
As semiconductor technology advances, the exploration of novel materials and device
architectures becomes imperative to meet the growing demands of integrated circuits for …

A Compact Model for BEOL-Compatible Ferroelectric Thin Film Transistors With Metal/Ferroelectric/Semiconductor Structure

W Zhang, J Wang, C Sun, Q Kong, Z Wu… - IEEE Journal of the …, 2024 - ieeexplore.ieee.org
In this article, we propose a physics-based compact model for BEOL-compatible ferroelectric
thin film transistors with amorphous oxide semiconductor channel (OS-FeTFTs) to …

Percolation theory-based KMC simulation for scaled Fe-FET based multi-bit computing-in-memory with temperature compensation strategy

Q Zhu, L Xu, Z Zhou, W Wei, P Xv, C Dou… - …, 2025 - iopscience.iop.org
In this letter, we investigate the impact of percolation transport mechanisms on ferroelectric
field effect transistor (FeFET) multi-value storage with kinetic Monte-Carlo (KMC) simulation …

Monolithic 3D Integration using BEOL FeFET: Reliability, Thermal Effects, and DNN Accuracy

S Kumar, YS Chauhan… - 2024 8th IEEE Electron …, 2024 - ieeexplore.ieee.org
In this paper, we demonstrate the impact of different chip integration techniques such as 2D,
heterogeneous 3D (H3D), and monolithic 3D (M3D) on the reliability of compute-in-memory …

Benchmarking IWO-based Logic Circuits for Monolithic 3D Integration

S Shahin, S Kumar, S Chatterjee… - 2024 8th IEEE …, 2024 - ieeexplore.ieee.org
This study shows a comprehensive evaluation of Back End Of Line (BEOL) compatible
Tungsten doped amorphous Indium Oxide (a-IWO) Dual-Gate (DG) Thin Film Transistor …