[BOOK][B] Semiconductor surfaces and interfaces

W Mönch - 2013 - books.google.com
Semiconductor Surfaces and Interfaces deals with structural and electronic properties of
semiconductor surfaces and interfaces. The first part introduces the general aspects of …

Defect self-annihilation in surfactant-mediated epitaxial growth

M Horn-von Hoegen, FK LeGoues, M Copel… - Physical review …, 1991 - APS
Islanding and misfit relaxation are obstacles for growth of heteroepitaxial films. Surfactants
not only inhibit islanding, but also control defect structure. Growth of Ge on Si (111) was …

Geometric and electronic structure of Sb on Si (111) by scanning tunneling microscopy

HB Elswijk, D Dijkkamp, EJ Van Loenen - Physical Review B, 1991 - APS
Scanning tunneling microscopy and spectroscopy (STS) are used to investigate the Si (111)-
Sb surface. At an Sb coverage of a few percent of a monolayer (ML), Sb substitutes Si …

Ordered Peierls distortion prevented at growth onset of GeTe ultra-thin films

R Wang, D Campi, M Bernasconi, J Momand, BJ Kooi… - Scientific reports, 2016 - nature.com
Using reflection high-energy electron diffraction (RHEED), the growth onset of molecular
beam epitaxy (MBE) deposited germanium telluride (GeTe) film on Si (111)-(√ 3×√ 3) R30° …

KPFM imaging of Si (1 1 1) 53× 53-Sb surface for atom distinction using NC-AFM

K Okamoto, K Yoshimoto, Y Sugawara, S Morita - Applied surface science, 2003 - Elsevier
We investigate the possibility of distinction of individual atom species using noncontact
atomic force microscopy (NC-AFM) combined with the electrostatic force (ESF) …

Evidence for trimer reconstruction of Si (111)√ 3×√ 3-Sb: Scanning tunneling microscopy and first-principles theory

P Mårtensson, G Meyer, NM Amer, E Kaxiras… - Physical Review B, 1990 - APS
Scanning-tunneling-microscopy images of the Si (111)√ 3×√ 3-Sb surface show a trigonal
lattice of protrusions, with a characteristic dependence on bias voltage. When probing filled …

Scanning tunneling microscopy of surfactant-mediated epitaxy of Ge on Si (111): Strain relief mechanisms and growth kinetics

G Meyer, B Voigtländer, NM Amer - Surface science, 1992 - Elsevier
The role of strain relief and kinetics in surfactant-mediated epitaxial growth of Ge on Si (111)
was studied with scanning tunneling microscopy. For coverages of up to≈ 20 ML the …

Surfactant-mediated growth of Ge on Si (111)

M Horn-von Hoegen, M Copel, JC Tsang, MC Reuter… - Physical Review B, 1994 - APS
The introduction of a surfactant changes the growth in the Si (111)/Ge system from islanding
to a continuous film. A Sb monolayer floats at the growth front without detectable …

Sb adsorption on Si< 111> analyzed by ellipsometry and reflection high‐energy electron diffraction: Consequences for Sb do** in Si molecular‐beam epitaxy

S Andrieu - Journal of applied physics, 1991 - pubs.aip.org
In this paper, two distinct studies are presented: Sb adsorption on Si< 111> analyzed by
both ellipsometry and electron diffraction in real time, and Sb do** in Si molecular‐beam …

The interplay of surface morphology and strain relief in surfactant mediated growth of Ge on Si (111)

M Horn-von Hoegen, M Pook, A Al Falou, BH Müller… - Surface science, 1993 - Elsevier
The growth of Ge on Si is strongly modified by surface active species called surfactants.
While the effectiveness of Sb as a surfactant in forcing layer-by-layer growth of Ge on Si …