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Power semiconductor device with an auxiliary gate structure
M Arnold, L Efthymiou, F Udrea, G Longobardi… - US Patent …, 2024 - Google Patents
2021-08-13 Assigned to CAMBRIDGE ENTERPRISE LIMITED reassignment CAMBRIDGE
ENTERPRISE LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR …
ENTERPRISE LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR …
High electron mobility transistor and method of manufacturing the same
J Oh, J Kim - US Patent 11,335,802, 2022 - Google Patents
Provided are a high electron mobility transistor and a method of manufacturing the high
electron mobility tran sistor. The high electron mobility transistor includes a gate electrode …
electron mobility tran sistor. The high electron mobility transistor includes a gate electrode …
High electron mobility transistor and method of manufacturing the same
J Oh, J Kim - US Patent 11,757,029, 2023 - Google Patents
H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating
or switching and having potential barriers; Capacitors or resistors having potential barriers …
or switching and having potential barriers; Capacitors or resistors having potential barriers …
Group III-V IC with different sheet resistance 2-DEG resistors
DS Lee, H Tomomatsu - US Patent 12,211,835, 2025 - Google Patents
An integrated circuit (IC) includes a lower group III-N layer having a first composition over a
substrate, and an upper group III-N layer having a different second composition over the …
substrate, and an upper group III-N layer having a different second composition over the …
Manufacturing method for forminginsulating structure of high electron mobility transistor
CM Chang, WJ Liao - US Patent 12,199,175, 2025 - Google Patents
The present invention provides a method of forming an insulating structure of a high electron
mobility transistor (HEMT), firstly, a gallium nitride layer is formed, next, an aluminum gallium …
mobility transistor (HEMT), firstly, a gallium nitride layer is formed, next, an aluminum gallium …
Nitride-based semiconductor layer sharing between transistors
DS Lee - US Patent 11,527,619, 2022 - Google Patents
(57) ABSTRACT A semiconductor structure includes a first transistor includ ing a gate
structure, a drain, and a source. The gate structure of the first transistor includes a nitride …
structure, a drain, and a source. The gate structure of the first transistor includes a nitride …
Semiconductor device having a programming element
US11444090B2 - Semiconductor device having a programming element - Google Patents
US11444090B2 - Semiconductor device having a programming element - Google Patents …
US11444090B2 - Semiconductor device having a programming element - Google Patents …
Insulating structure of high electron mobility transistor and manufacturing method thereof
CM Chang, WJ Liao - US Patent 11,380,786, 2022 - Google Patents
An insulating structure of a high electron mobility transistor (HEMT) is provided, which
comprises a gallium nitride layer, an aluminum gallium nitride layer disposed on the gallium …
comprises a gallium nitride layer, an aluminum gallium nitride layer disposed on the gallium …
Modular converter and modular converter system
J Fürst, F Diepold - US Patent 11,233,461, 2022 - Google Patents
(57) ABSTRACT A modular converter includes an inverter having power semiconductor
switches made of GaN or InGaN and being operated with a blocking voltage of at least 400V …
switches made of GaN or InGaN and being operated with a blocking voltage of at least 400V …
Diode with low threshold voltage and high breakdown voltage
M Zhang, H Elwan - US Patent 11,190,177, 2021 - Google Patents
Techniques are described for implementing diodes with low threshold voltages and high
breakdown voltages. Some embodiments further implement diode devices with pro …
breakdown voltages. Some embodiments further implement diode devices with pro …