This review paper gives an overview of recent developments in nanoparticle research and
semiconductor industry applications. Nanoparticles have become useful building blocks for …

Materials with the desirable surface wettability are of key importance in diverse applications.
However, most of the existing chemical processes used for surface wettability control are …

The application of gas discharge plasmas has assumed an important place in many
manufacturing processes. Plasma methods contribute significantly to the economic …

Along with the search for new therapeutic agents, advanced formulation and fabrication of
drug carriers are required for better targeting, sensing, and responding to environmental …

Heterogeneous integration of indium phosphide (InP) onto the Si platform via plasma-
activated bonding enables efficient evanescent coupling with lower dislocation density …

Minimally invasive procedures assisted by soft robots for surgery, diagnostics, and drug
delivery have unprecedented benefits over traditional solutions from both patient and …

Plasma etching, a conventional technique in semiconductor industry, has exhibited great
potentials in fabricating nanoscale patterns by taking advantage of its high anisotropic …

The design of advanced materials with superb anti-bacterial efficiency by engineering
appropriate surface properties has now become a consolidated strategy to improve the …

We propose a plasma-activated direct bonding process at low temperatures (≤ 200° C) to
form heterostructures between single-crystalline SiC and conventional Si-based substrates …

The high equipment intensity and complexity of production processes in semiconductor
manufacturing leads to challenging requirements regarding plant availability in this …