Plasmon-driven hot electron transfer at atomically sharp metal–semiconductor nanojunctions
Recent advances in guiding and localizing light at the nanoscale exposed the enormous
potential of ultrascaled plasmonic devices. In this context, the decay of surface plasmons to …
potential of ultrascaled plasmonic devices. In this context, the decay of surface plasmons to …
Copper oxide quantum dot ink for inkjet-driven digitally controlled high mobility field effect transistors
Copper oxide (CuO) quantum dots (QDs) having a diameter of 5–8 nm were synthesized by
a simple solution process. The as-synthesized QDs showed a highly crystalline monoclinic …
a simple solution process. The as-synthesized QDs showed a highly crystalline monoclinic …
Electronic Transport Modulation in Ultrastrained Silicon Nanowire Devices
MG Bartmann, S Glassner, M Sistani… - … Applied Materials & …, 2024 - ACS Publications
In this work, we explore the effect of ultrahigh tensile strain on electrical transport properties
of silicon. By integrating vapor–liquid–solid-grown nanowires into a micromechanical …
of silicon. By integrating vapor–liquid–solid-grown nanowires into a micromechanical …
[PDF][PDF] Nanoscale patterning by AFM lithography and its application on the fabrication of silicon nanowire devices
Many techniques have been applied to fabricate nanostructures via top-down approach
such as electron beam lithography. However, most of the techniques are very complicated …
such as electron beam lithography. However, most of the techniques are very complicated …
Electrical characteristics of silicon nanowire transistor fabricated by AFM lithography
SD Hutagalung, KC Lew - 2010 IEEE International Conference …, 2010 - ieeexplore.ieee.org
Atomic force microscope (AFM) nanolithography was performed to create nanowire
transistor pattern via local anodic oxidation process on surface of silicon-on-insulator (SOI) …
transistor pattern via local anodic oxidation process on surface of silicon-on-insulator (SOI) …
Electrical characterization of metal–silicon microwire interface using conductive atomic force microscope
Ni-catalyzed silicon microwires (SiMWs) were grown on n-Si (111) substrate. The bottom
contacts of the SiMWs were selectively formed using Ni electrodeposition at the substrate …
contacts of the SiMWs were selectively formed using Ni electrodeposition at the substrate …
[PDF][PDF] Effect of TMAH etching duration on the formation of silicon nanowire transistor patterned by AFM nanolithography
TMNMD Atom, SD HUTAGALUNG, K LEW - Sains Malaysiana, 2012 - core.ac.uk
Atomic force microscopy (AFM) lithography was applied to produce nanoscale pattern for
silicon nanowire transistor fabrication. This technique takes advantage of imaging facility of …
silicon nanowire transistor fabrication. This technique takes advantage of imaging facility of …
Fabrication of single-nanowire sensing devices by electron beam lithography
In this paper, we report on the feasibility of single nanowire devices fabrication by electron
beam lithography. SnO 2 and ZnO nanowires bundles have been synthesized by vapor …
beam lithography. SnO 2 and ZnO nanowires bundles have been synthesized by vapor …
Current-voltage characteristics of side-gated silicon nanowire transistor fabricated by AFM lithography
SD Hutagalung, KC Lew - Advanced Materials Research, 2011 - Trans Tech Publ
Silicon nanowire transistor (SiNWT) was fabricated by using a silicon nanowire as a channel
which directly connected to the source (S) and drain (D). In this work, a side gate (G) …
which directly connected to the source (S) and drain (D). In this work, a side gate (G) …
Semiconductor nanowire memory device
H Nishizawa, S Itoh - US Patent 8,390,066, 2013 - Google Patents
According to an embodiment, a semiconductor memory device capable of stably operating
even when an element is shrunk is provided. The semiconductor memory device of the …
even when an element is shrunk is provided. The semiconductor memory device of the …