[SÁCH][B] Multi-Net Optimization of VLSI Interconnect

K Moiseev, A Kolodny, S Wimer - 2015 - Springer
Interconnect has become a crucial element in advanced electronic systems. State-ofthe-art
CMOS processes utilize 10 or more layers of metal above the active transistors, so these …

Efficient cell-based migration of VLSI layout

E Shaphir, RY Pinter, S Wimer - Optimization and Engineering, 2015 - Springer
Abstract In Intel's “Tick-Tock” roadmap a new processor is first manufactured in the most
advanced stable process technology, followed in a 1-year delay by introducing chips …

Cell-based interconnect migration by hierarchical optimization

E Shaphir, RY Pinter, S Wimer - Integration, 2014 - Elsevier
Abstract Fueled by Moore's Law, VLSI market competition and economic considerations
dictates the introduction of new processor's microarchitecture in a two-year cycle called “Tick …

The complexity of VLSI power-delay optimization by interconnect resizing

K Moiseev, A Kolodny, S Wimer - Journal of combinatorial optimization, 2012 - Springer
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the
interconnect widths and spaces to a very small set of admissible values. Until recently the …