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[SÁCH][B] Multi-Net Optimization of VLSI Interconnect
Interconnect has become a crucial element in advanced electronic systems. State-ofthe-art
CMOS processes utilize 10 or more layers of metal above the active transistors, so these …
CMOS processes utilize 10 or more layers of metal above the active transistors, so these …
Efficient cell-based migration of VLSI layout
Abstract In Intel's “Tick-Tock” roadmap a new processor is first manufactured in the most
advanced stable process technology, followed in a 1-year delay by introducing chips …
advanced stable process technology, followed in a 1-year delay by introducing chips …
Cell-based interconnect migration by hierarchical optimization
Abstract Fueled by Moore's Law, VLSI market competition and economic considerations
dictates the introduction of new processor's microarchitecture in a two-year cycle called “Tick …
dictates the introduction of new processor's microarchitecture in a two-year cycle called “Tick …
The complexity of VLSI power-delay optimization by interconnect resizing
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the
interconnect widths and spaces to a very small set of admissible values. Until recently the …
interconnect widths and spaces to a very small set of admissible values. Until recently the …