Transient stress characterization of AlGaN/GaN HEMTs due to electrical and thermal effects

JP Jones, E Heller, D Dorsey, S Graham - Microelectronics Reliability, 2015‏ - Elsevier
In this paper, we present finite element simulation results of the transient stress response of
an AlGaN/GaN high electron mobility transistor (HEMT). The modeling technique involves a …

Guidelines for reduced-order thermal modeling of multifinger GaN HEMTs

R Pearson, B Chatterjee, S Kim… - Journal of …, 2020‏ - asmedigitalcollection.asme.org
The increasing demand for tightly integrated gallium nitride high electron mobility transistors
(HEMT) into electronics systems requires accurate thermal evaluation. While these devices …

Electro-thermal reliability study of GaN high electron mobility transistors

B Chatterjee, JS Lundh, J Dallas… - 2017 16th IEEE …, 2017‏ - ieeexplore.ieee.org
Self-heating in AlGaN/GaN high electron mobility transistors (HEMT) degrades device
performance and reliability. Under nominal operating conditions, a so-called hot spot …

The effects of gate-connected field plates on hotspot temperatures of AlGaN/GaN HEMTs

C Dundar, D Kara, N Donmezer - IEEE Transactions on …, 2019‏ - ieeexplore.ieee.org
To increase the reliability and the maximum performance of AlGaN/GaN high electron
mobility transistors (HEMTs), gate field plates are frequently used with surface passivation …

AlGaN/GaN HEMT device physics and electrothermal modeling

B Chatterjee, D Shoemaker, HY Wong… - Thermal Management of …, 2022‏ - Elsevier
Gallium nitride (GaN) has emerged as one of the most attractive materials for radio
frequency (RF) and power conversion technologies that require high-power and high …

Electro-thermal device-package co-design for ultra-wide bandgap gallium oxide power devices

B Albano, B Wang, Y Zhang… - 2022 IEEE Energy …, 2022‏ - ieeexplore.ieee.org
The ultra-wide bandgap (UWBG) of Ga2O 3 allows it to achieve over nearly 1033-times
lower intrinsic carrier concentration than silicon (Si), permitting Ga2O 3 devices to operate at …

The thermal effects of substrate removal on GaN HEMTs using Raman Thermometry

G Pavlidis, D Mele, T Cheng… - 2016 15th IEEE …, 2016‏ - ieeexplore.ieee.org
The ability to fabricate AlGaN/GaN high electron mobility transistors (HEMTs) on Si
substrates has enabled the production of low cost high power electronics. To further …

Time dependent shift in SOA boundary and early breakdown of epi-stack in AlGaN/GaN HEMTs under fast cyclic transient stress

B Shankar, S Shikha, A Singh, J Kumar… - … on Device and …, 2020‏ - ieeexplore.ieee.org
This experimental study reports first observations of (i) SOA boundary shift in AlGaN/GaN
HEMTs and (ii) early time-to-fail of vertical AlGaN/GaN epi-stack under fast changing (sub …

Integrated temperature map** of lateral gallium nitride electronics

JS Lundh, B Chatterjee, J Dallas… - 2017 16th IEEE …, 2017‏ - ieeexplore.ieee.org
For the first time, an integrated thermal characterization scheme that generates a full two-
dimensional temperature map of GaN lateral devices has been developed. Through …

Nanometer-scale strain measurements in AlGaN/GaN high-electron mobility transistors during pulsed operation

MR Rosenberger, JP Jones, ER Heller… - … on Electron Devices, 2016‏ - ieeexplore.ieee.org
Electric, thermal, and mechanical strain fields drive the degradation of AlGaN/GaN high-
electron mobility transistors (HEMTs). The resulting mechanical strains within the devices …