Systems and methods for improved semiconductor etching and component protection
TF Tan, LK Loh, D Lubomirsky, J Soonwook… - US Patent …, 2019 - Google Patents
Semiconductor systems and methods may include a semiconductor processing chamber
having a gas box defining an access to the semiconductor processing chamber. The …
having a gas box defining an access to the semiconductor processing chamber. The …
Systems and methods for improved semiconductor etching and component protection
TF Tan, LK Loh, D Lubomirsky, J Soonwook… - US Patent …, 2019 - Google Patents
Semiconductor systems and methods may include a semi conductor processing chamber
having a gas box defining an access to the semiconductor processing chamber. The cham …
having a gas box defining an access to the semiconductor processing chamber. The cham …
Methods and systems to enhance process uniformity
3, 969077 4006047 4, 190488 4.209. 357 4,214,946 4, 232060 4.234. 628 4,265.943
4,340,462 4,341,592 4,361,418 4,364,803 4,368.223 4, 374698 4,381,441 4,397,812 …
4,340,462 4,341,592 4,361,418 4,364,803 4,368.223 4, 374698 4,381,441 4,397,812 …
Dual-channel showerhead with improved profile
D Lubomirsky - US Patent 10,546,729, 2020 - Google Patents
Described processing chambers may include a chamber housing at least partially defining
an interior region of the semiconductor processing chamber. The chambers may include a …
an interior region of the semiconductor processing chamber. The chambers may include a …
Semiconductor processing systems having multiple plasma configurations
D Lubomirsky, X Chen, S Venkataraman - US Patent 10,256,079, 2019 - Google Patents
An exemplary system may include a chamber configured to contain a semiconductor
substrate in a processing region of the chamber. The system may include a first remote …
substrate in a processing region of the chamber. The system may include a first remote …
Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrate
ML Zucker, DJ Devine, YJ Lee - US Patent 8,405,005, 2013 - Google Patents
An electrostatic chuck system for maintaining a desired temperature profile across the
surface of the substrate is disclosed. The electrostatic chuck system includes a pedestal …
surface of the substrate is disclosed. The electrostatic chuck system includes a pedestal …
Pixelated capacitance controlled ESC
R Sadjadi, B Wendell Glen, VD Parkhe… - US Patent …, 2016 - Google Patents
Implementations described herein provide a pixilated elec trostatic chuck which enables
both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a …
both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a …
Electrostatic chuck
RA Cooke - US Patent 10,395,963, 2019 - Google Patents
In accordance with an embodiment of the invention, there is provided an electrostatic chuck
comprising an electrode, and a surface layer activated by a voltage in the electrode to form …
comprising an electrode, and a surface layer activated by a voltage in the electrode to form …
Tungsten separation
X Wang, J Liu, A Wang, NK Ingle - US Patent 9,553,102, 2017 - Google Patents
Methods of selectively etching tungsten from the surface of a patterned substrate are
described. The etch electrically separates vertically arranged tungsten slabs from one …
described. The etch electrically separates vertically arranged tungsten slabs from one …
Generation of compact alumina passivation layers on aluminum plasma equipment components
A process for generating a compact alumina passivation layer on an aluminum component
includes rinsing the component in deionized water for at least one minute, drying it for at …
includes rinsing the component in deionized water for at least one minute, drying it for at …