Electron beam generated plasmas for the processing of graphene

SG Walton, SC Hernández, DR Boris… - Journal of Physics D …, 2017 - iopscience.iop.org
Abstract The Naval Research Laboratory (NRL) has developed a processing system based
on an electron beam-generated plasma and applied it to the processing of graphene. Unlike …

[HTML][HTML] Numerical thermalization in 2D PIC simulations: Practical estimates for low-temperature plasma simulations

S Jubin, AT Powis, W Villafana, D Sydorenko… - Physics of …, 2024 - pubs.aip.org
The process of numerical thermalization in particle-in-cell (PIC) simulations has been
studied extensively. It is analogous to Coulomb collisions in real plasmas, causing particle …

Particle-in-cell modeling of electron beam generated plasma

S Rauf, D Sydorenko, S Jubin… - Plasma Sources …, 2023 - iopscience.iop.org
Plasmas generated using energetic electron beams are well known for their low electron
temperature (T e) and plasma potential, which makes them attractive for atomic-precision …

Three-dimensional model of electron beam generated plasma

S Rauf, A Balakrishna, A Agarwal, L Dorf… - Plasma Sources …, 2017 - iopscience.iop.org
A three-dimensional model for magnetized electron beam generated plasma is described,
which includes a coupled fluid simulation of the bulk plasma and a Monte Carlo model for …

Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas

G Antoun, T Tillocher, A Girard, P Lefaucheux… - Journal of Vacuum …, 2022 - pubs.aip.org
This article first presents quasi-in situ XPS measurements on Si 3 N 4 and a-Si samples after
exposure to an SiF 4/O 2 plasma at different cryogenic temperatures. A different behavior is …

[HTML][HTML] Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

DR Boris, TB Petrova, GM Petrov… - Journal of Vacuum …, 2017 - pubs.aip.org
Electron beam generated plasmas are generally characterized by a high plasma density (>
10 10 cm− 3), and very low electron temperatures (< 1 eV), making them well-suited for next …

[HTML][HTML] Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films

SG Walton, DR Boris, SG Rosenberg… - Journal of Vacuum …, 2021 - pubs.aip.org
In the ideal case, plasma-enhanced atomic layer etching enables the ability to not only
remove one monolayer of material but also leave adjacent layers undamaged. This dual …

Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection

Y Zhou, Y Wang, H Wu, H Wang, W Jiang… - Physica …, 2024 - iopscience.iop.org
The modulated approach of electron beam (EB) injection can achieve favorable parameters
for capacitive coupled plasmas (CCP). In this work, a one-dimensional particle-in-cell/Monte …

[HTML][HTML] Precise control of ion and radical production using electron beam generated plasmas

DR Boris, SG Walton - Journal of Vacuum Science & Technology A, 2018 - pubs.aip.org
Precise control over both the relative and absolute flux of plasma species as well as their
energy deposition at surfaces is critical to enabling the plasma processing of materials with …

On the ion flux from beam plasma to a metal target irradiated by a pulsed electron beam in the forevacuum pressure range

AV Kazakov, EM Oks… - IEEE Transactions on …, 2023 - ieeexplore.ieee.org
We describe our investigations of the influence of electron beam parameters and working
gas on the ion flux coming from the beam-produced plasma (beam plasma) to a target …